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| Generation of ultra-high concentration ozone gas by adopting the nitrogen |
| non-adding method |
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The development of unique construction electrode has achieved the top-class ultra-high concentration of 400g/m3(N) maximum in the industry. |
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| Restriction in generation of metal contaminant by adopting the nitrogen non- |
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It is possible for clean ozone gas (of which nitrogen oxide generation is restricted to its ultimate limit*1) to maintain the desired quality for furthermore miniaturizing pattern, and to enhance the film quality.
*1:Nitrogen oxide concentration 0.01ppm or less（1/10000 as comparison with our previous model） |
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Succession of unique ultra-short gap discharge technology |
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The generator of this type has succeeded the ultra-short gap discharge Technology having excellent start-up characteristic, stability and cooling efficiency. |
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Compatible to international standard |
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Compliance with CE marking and SEMI-S2. |
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| unit:ng/m3 |
| Element |
Na |
Al |
K |
Ca |
Ti |
Cr |
Mn |
Fe |
Ni |
Cu |
Zn |
| Ozone Gas |
N.D. |
N.D. |
N.D. |
N.D. |
N.D. |
N.D. |
N.D. |
N.D. |
N.D. |
N.D. |
N.D. |
| Detection
Limit |
1.5 |
3.0 |
1.5 |
3.0 |
1.5 |
0.3 |
4.0 |
1.5 |
4.5 |
3.0 |
3.0 |
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| Note1:Reference value. |
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H series |
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Generates industry's leading super-high concentration ozone gas without using nitrogen additives.
 Main applications  Semiconductor manufacturing processes,
etc. |
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 Details |
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P series |
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Generates clean ozone gas using only highly pure oxygen without using nitrogen additives.
Main applications Semiconductor manufacturing processes,
etc. |
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Details |
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C series |
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Generates clean ozone gas suitable for semiconductor manufacturing processes.
Main applications Semiconductor manufacturing processes,
etc. |
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Details |
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N series |
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Generates high concentration ozone gas using common oxygen.
Main applications Semiconductor manufacturing processes,
chemical processes, food manufacturing processes, water treatment, etc. |
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Details |
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U series |
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Manufacture of clean ozone water suitable for semiconductor
manufacturing processes.
Main applications Semiconductor manufacturing process, precision machine part cleaning, etc.
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Details |
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